Formation peculiarities of free-standing III-v single crystalline films prepared by solution method

Authors

  • V. Antoschenko al-Farabi Kazakh National University
  • A. Migunova al-Farabi Kazakh National University
  • V. Francev al-Farabi Kazakh National University
  • O. Lavrischev al-Farabi Kazakh National University
  • Y. Antochshenko al-Farabi Kazakh National University

DOI:

https://doi.org/10.26577/phst-2014-1-16

Keywords:

Free-standing film, Gallium Arsenide, Solution Growth, Phase Equilibrium, III-V Compounds.

Abstract

In this paper, liquid phase epitaxy method used for the synthesis of free-standing single crystalline films of IIIV compounds by interaction of the quaternary Sn-Al-Ga-As liquid with binary solid GaAs substrate. It is shown that the possibility of the formation of free-standing single-crystalline films in such systems is determined by thermodynamic and kinetic conditions near liquid-solid interface at the growth temperature. On the basis of thermodynamic analysis and experimental study of similar multi-component systems were identified key crystallization criteria of these films. These criteria were used to predict the synthesis of free-standing binary semiconductor films on a distance from the initial semiconductor substrate in some systems.

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Published

2015-04-29

Issue

Section

Condensed Matter Physics and Related Techology

How to Cite

Formation peculiarities of free-standing III-v single crystalline films prepared by solution method. (2015). Physical Sciences and Technology, 1(1). https://doi.org/10.26577/phst-2014-1-16