R&d of CVD technique for graphene production

Authors

  • N.R. Guseinov Al-Farabi Kazakh National University, NNLOT, al-Farabi 71, 050040 Almaty, Kazakhstan
  • V.V. Kudryashov Al-Farabi Kazakh National University, NNLOT, al-Farabi 71, 050040 Almaty, Kazakhstan
  • G.A. Baigarinova Al-Farabi Kazakh National University, NNLOT, al-Farabi 71, 050040 Almaty, Kazakhstan
  • A.M. Ilyin Al-Farabi Kazakh National University, NNLOT, al-Farabi 71, 050040 Almaty, Kazakhstan

DOI:

https://doi.org/10.26577/2409-6121-2015-2-1-13-17

Keywords:

Key words, graphene, CVD, optical microscopy, Raman spectroscopy. PACS numbers, 68.65.Pq

Abstract

Currently production of large-sized graphene samples is of great importance due to the broad potential applications of this material with high physical performance. In this paper we consider one of the widely used methods of graphene production - chemical vapor deposition (CVD), which was worked out by our team. We used as a catalyst of Ni foil and carbon source were benzene vapor. Also, we show results of computer simulation by DFT methods that demonstrate possibility and effectiveness of graphene production by CVD method. The characteristics of graphene have been studied by optical microscopy and Raman spectroscopy. The results show high quality and homogeneity of the obtained graphene.

References

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Published

2016-10-03

Issue

Section

Nuclear Physics and Related Techology